International MOS-AK Workshop , Chengdu, China June 20-22, 2019

   The International MOS-AK Workshop in Chengdu, China, is dedicated to advanced electronic and photonic devices. MOS-AK modeling group and circle has more than 20 years enabling R&D exchange. For additional detailed info, please refer to MOS-AK website: 

  With the aggressive scaling of CMOS technologies and constantly emerging diversified devices, accurate device modeling technique poses severe challenge to circuit and system designers, in particular for RF/MW/mmW/THz/optics. With this background, the workshop aims to strengthen a network and discussion forum among experts in the field, provide a forum for the presentation and discussion of the leading edge research and development results of Compact Modeling, Characterization and Simulation techniques for advanced devices, circuits and technologies. Modeling and validation technique of all solid-state devices, including, Si, III-V, power, nanoscale electronic structures and other related new devices are within the scope of the conference. The theme of MOS-AK is “Bridge of Process Technology and Integrated Circuits & Systems Design”.

     The International MOS-AK Workshop will be held on 21-22th June, 2019 in Chengdu, China. Place is  University of Electronic Science and Technology of China (UESTC). The main goal is to exchange compact modeling (CM) related know-how and promote modeling technique to support semiconductor industry. In addition to oral presentations, distinguished experts in the modeling field will be invited to deliver keynote speeches on significant trends, advancements and applications in areas related to the theme. On 20th.June. 2019, we also prepare for 1-day training course related to “ Silicon-Germanium Heterojunction Bipolar Transistors for mm-Wave Systems Technology, Modeling and Circuit Applications”held by Dr. Andreas Pawlak and Dr. Wojciech Debski. In addition, a national students design competition based on GaN HEMT on Si process (OMMIC GaN D01GH) will be also announced. Winners ,either single person or team will be awarded with free tapeout , bonus & issued certificate supported by Yifeng-UESTC. 

    We welcome company to show their latest equipment, tools or other stuff related to the compact modeling. After workshop, extremely excellent papers will be selected and recommended for publication in the renowned Journal such as Weily’s International Journal of Numerical Modelling: Electronic Networks, Devices and Fields (SCI Index) or International Journal of High Speed Electronics and Systems (EI Index).